NLS-Glossary
Antireflection coating (AR)
is a thin dielectric layer coated on an optical device or component to reduce the reflection of light and increase the transmitted light intensity. Consider a thin layer of a dielectric material such as (silicon nitride) on the surface of a semiconductor optoelectronic device such as a solar cell. If this antireflection coating has an intermediate refractive index then the thin dielectric coating can reduces the reflected light intensity. In this case n1(air) = 1, n2(coating) ≈ 1.9 and n3(Si) = 3.5. Light is first incident on the air/coating surface and some of it becomes reflected. Suppose that this reflected wave is A. Wave A has experienced a 180° phase change on reflection as this is an external reflection. The wave that enters and travels in the coating then becomes reflected at the coating/semiconductor surface. This wave, say B, also suffers a 180° phase change since n3 > n2. When wave B reaches A, it has suffered a total delay of traversing the thickness d of the coating twice. The phase difference is equivalent to where is the wavevector in the coating and is given by where c is the wavelength in the coating. Since where λ is the free-space wavelength, the phase difference Δφ between A and B is ( )(2d). To reduce the reflected light, A and B must interfere destructively and this requires the phase difference to be π or oddmultiples of π, mπ where m = 1,3,5,… is an odd-integer. Thus , - Thus, the thickness of the coating must be multiples of the quarter wavelength in the coating and depends on the wavelength. To obtain a good degree of destructive interference between waves A and B, the two amplitudes must be comparable. It turns out that we need When then the reflection coefficient between the air and coating is equal to that between the coating and the semiconductor. In this case we would need or 1.87. Thus, is a good choice as an antireflection coating material on Si solar cells. Generally an AR coating operates at one or over a narrow range of wavelengths